Transition from superhydrophilic to superhydrophobic of silicon wafer by a combination of laser treatment and fluoropolymer deposition

Sergey V. Starinskiy, Alexander V. Bulgakov, Elizaveta Ya Gatapova, Yuri G. Shukhov, Veronica S. Sulyaeva, Nikolay I. Timoshenko, Alexey I. Safonov

Результат исследования: Научные публикации в периодических изданияхстатья

4 Цитирования (Scopus)

Аннотация

We propose a novel approach for synthesizing silicon surfaces ensuring arbitrary apparent contact angle within the range from 0° to 170° for water. Superhydrophilicity of silicon substrates is achieved by nanosecond laser treatment and subsequent change in the contact angle is obtained by deposition of fluoropolymer films with different thicknesses by a hot wire chemical vapor deposition (HWCVD) method. The deposited film thickness needed to obtain superhydrophobicity was determined. The wettability properties of the produced fluoropolymer-silicon system are analyzed using the Wenzel and Cassie theories.

Язык оригиналаанглийский
Номер статьи255307
Число страниц7
ЖурналJournal Physics D: Applied Physics
Том51
Номер выпуска25
DOI
СостояниеОпубликовано - 27 июн 2018

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