Intensive evaporation of a thin liquid film, moving in a flat micro-/minichannel under the action of gas flow is very promising for the use in cooling systems of modern semiconductor devices with localized heat sources of high intensity. In this work, using the high-speed visualization, the effect of the formation of dry spots on heat transfer in a locally heated liquid film shear-driven in a channel was investigated. It was found that the maximum intensity of heat removal from the heater is achieved in the mode, when the film flow continuity is broken. During the experiment the total area of dry spots increases with increasing heat flux and heater temperature, but when the heater reaches a certain temperature (≈100°C), the total area begins to decrease. However, the length of contact line increases with increasing heat flux and reaches a maximum in the pre-crisis regime. Intensive evaporation in the region of the contact line may explain the achievement of high heat fluxes in the shear-driven liquid film.