This paper describes a study of the optical methods for fabrication of multilevel profile in the layers of a Hybrimer-TATS hybrid photopolymer material based on thiol-siloxane and acrylate oligomers. Grayscale photolithography and direct laser writing are used to form multilevel structures 3.5 and 6 μ in height, respectively. The characteristic curves and photosensitivity of the material are determined. The film preparation and treatment processes are optimized, and it is determined that addition of the stages of pre- and post-exposure significantly affects the photosensitive properties of Hybrimer-TATS. The photopolymer is promising as a structural material for the formation of microstructured optical components.
|Журнал||Optoelectronics, Instrumentation and Data Processing|
|Состояние||Опубликовано - 1 сент. 2017|