Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy

N. I. Fainer, A. G. Plekhanov, I. P. Asanov

Результат исследования: Научные публикации в периодических изданияхстатья

2 Цитирования (Scopus)

Аннотация

The element composition and chemical bonds of nanocomposite films of hydrogenated silicon oxycarbonitride fabricated through high-frequency plasma-chemical deposition from initial gas mixtures of 1,1,3,3-tetramethyldisilazane with nitrogen and oxygen in the temperature range 373–973 K depending on the synthesis conditions is studied. The effect of changes in the temperature and chemical composition of the initial gas mixtures on the element composition and types of chemical bonds in SiCxNyOz:H films is investigated.

Язык оригиналаанглийский
Страницы (с-по)410-416
Число страниц7
ЖурналGlass Physics and Chemistry
Том43
Номер выпуска5
DOI
СостояниеОпубликовано - 1 сен 2017

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