Аннотация
The element composition and chemical bonds of nanocomposite films of hydrogenated silicon oxycarbonitride fabricated through high-frequency plasma-chemical deposition from initial gas mixtures of 1,1,3,3-tetramethyldisilazane with nitrogen and oxygen in the temperature range 373–973 K depending on the synthesis conditions is studied. The effect of changes in the temperature and chemical composition of the initial gas mixtures on the element composition and types of chemical bonds in SiCxNyOz:H films is investigated.
Язык оригинала | английский |
---|---|
Страницы (с-по) | 410-416 |
Число страниц | 7 |
Журнал | Glass Physics and Chemistry |
Том | 43 |
Номер выпуска | 5 |
DOI | |
Состояние | Опубликовано - 1 сен 2017 |