Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy

N. I. Fainer; A. G. Plekhanov; I. P. Asanov

doi:10.1134/S1087659617050042

Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy

N. I. Fainer, A. G. Plekhanov, I. P. Asanov

Лаборатория углеродных наноматериалов ФЕН

Результат исследования: Научные публикации в периодических изданиях › статья › рецензирование

2 Цитирования (Scopus)

Аннотация

The element composition and chemical bonds of nanocomposite films of hydrogenated silicon oxycarbonitride fabricated through high-frequency plasma-chemical deposition from initial gas mixtures of 1,1,3,3-tetramethyldisilazane with nitrogen and oxygen in the temperature range 373–973 K depending on the synthesis conditions is studied. The effect of changes in the temperature and chemical composition of the initial gas mixtures on the element composition and types of chemical bonds in SiC_xN_yO_z:H films is investigated.

Язык оригинала	английский
Страницы (с-по)	410-416
Число страниц	7
Журнал	Glass Physics and Chemistry
Том	43
Номер выпуска	5
DOI	https://doi.org/10.1134/S1087659617050042
Состояние	Опубликовано - 1 сен 2017

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10.1134/S1087659617050042

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abstract = "The element composition and chemical bonds of nanocomposite films of hydrogenated silicon oxycarbonitride fabricated through high-frequency plasma-chemical deposition from initial gas mixtures of 1,1,3,3-tetramethyldisilazane with nitrogen and oxygen in the temperature range 373–973 K depending on the synthesis conditions is studied. The effect of changes in the temperature and chemical composition of the initial gas mixtures on the element composition and types of chemical bonds in SiCxNyOz:H films is investigated.",

keywords = "1,1,3,3-tetramethyldisilazane, EDS, hydrogenated silicon oxycarbonitride, plasma-chemical synthesis, XPS",

author = "Fainer, {N. I.} and Plekhanov, {A. G.} and Asanov, {I. P.}",

year = "2017",

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Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy. / Fainer, N. I.; Plekhanov, A. G.; Asanov, I. P.

В: Glass Physics and Chemistry, Том 43, № 5, 01.09.2017, стр. 410-416.

Результат исследования: Научные публикации в периодических изданиях › статья › рецензирование

TY - JOUR

T1 - Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy

AU - Fainer, N. I.

AU - Plekhanov, A. G.

AU - Asanov, I. P.

PY - 2017/9/1

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AB - The element composition and chemical bonds of nanocomposite films of hydrogenated silicon oxycarbonitride fabricated through high-frequency plasma-chemical deposition from initial gas mixtures of 1,1,3,3-tetramethyldisilazane with nitrogen and oxygen in the temperature range 373–973 K depending on the synthesis conditions is studied. The effect of changes in the temperature and chemical composition of the initial gas mixtures on the element composition and types of chemical bonds in SiCxNyOz:H films is investigated.

KW - 1,1,3,3-tetramethyldisilazane

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KW - hydrogenated silicon oxycarbonitride

KW - plasma-chemical synthesis

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