Silicon oxides and silicon nitrides: Structure, properties and applications in memristors

V. A. Volodin, G. N. Kamaev, V. N. Kruchinin, V. A. Gritsenko

Результат исследования: Публикации в книгах, отчётах, сборниках, трудах конференцийстатья в сборнике материалов конференциинаучнаярецензирование

Аннотация

The capacity of memory matrices grows exponentially, but in many approaches the degree of integration of memory elements already reaches physical limits, which stimulates research into the development of new physical principles and new materials for memory elements. Memristors are very promising elements of memory. The memristors are the basis for high-speed, non-volatile, radiation-resistant flash memory matrices of the new generation. The SiO x (0.3<x≤2) films of various stoichiometry were prepared using two methods: 1) evaporation of Si, SiO and SiO 2 targets and deposition in high vacuum; 2) plasma enhanced chemical vapor deposition (PECVD). The SiN x (0.5<x≤4/3) films were deposited using PECVD. Raman scattering spectroscopy, visible and infrared (IR) absorbance spectroscopy and spectral ellipsometry and electro-physical methods were used for studies of the films. According to Raman spectroscopy data, the as-deposited SiN x (x<1.1) contain amorphous Si clusters, high temperature annealings lead to crystallization of the clusters and forming of Si nanocrystals in such films. As for SiOx films, amorphous Si clusters were observed in asdeposited films with x≤1. These data were confirmed from analysis of ellipsometry data. The current-voltage (I-V) characteristics of the films were studied. Effects of switching from high resistance state (HRS) to low resistance state (LRS) were observed for SiO x based films. These switching can be used in memristors.

Язык оригиналаанглийский
Название основной публикацииInternational Conference on Micro- and Nano-Electronics 2018
РедакторыVladimir F. Lukichev, Konstantin V. Rudenko
ИздательSPIE
Число страниц8
Том11022
ISBN (электронное издание)9781510627093
DOI
СостояниеОпубликовано - 1 янв 2019
СобытиеInternational Conference on Micro- and Nano-Electronics 2018, ICMNE 2018 - Zvenigorod, Российская Федерация
Продолжительность: 1 окт 20185 окт 2018

Серия публикаций

НазваниеProceedings of SPIE
ИздательSPIE-INT SOC OPTICAL ENGINEERING
Том11022
ISSN (печатное издание)0277-786X

Конференция

КонференцияInternational Conference on Micro- and Nano-Electronics 2018, ICMNE 2018
СтранаРоссийская Федерация
ГородZvenigorod
Период01.10.201805.10.2018

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    Volodin, V. A., Kamaev, G. N., Kruchinin, V. N., & Gritsenko, V. A. (2019). Silicon oxides and silicon nitrides: Structure, properties and applications in memristors. В V. F. Lukichev, & K. V. Rudenko (Ред.), International Conference on Micro- and Nano-Electronics 2018 (Том 11022). [1102212] (Proceedings of SPIE; Том 11022). SPIE. https://doi.org/10.1117/12.2521759