Comparing the methods of copper substrate polishing for CVD graphene synthesis

I. A. Kostogrud, E. V. Boyko, P. E. Matochkin, D. V. Sorokin

Результат исследования: Научные публикации в периодических изданияхстатья по материалам конференциирецензирование


This paper presents a comparison of chemical and plasma electrolyte polishing methods for preparing a copper substrate for graphene synthesis by chemical vapour deposition. It is shown that in order to achieve the most uniform morphology of the surface of the copper substrate, it is preferable to use the electrolyte-plasma polishing method. With its help, the proportion of multilayer regions in the graphene coating obtained as a result of CVD synthesis decreases. The obtained results may serve a recommendation for creating a graphene coating with specified parameters.

Язык оригиналаанглийский
Номер статьи012121
ЖурналJournal of Physics: Conference Series
Номер выпуска1
СостояниеОпубликовано - 8 нояб. 2021
Событие6th All-Russian Conference on Thermophysics and Physical Hydrodynamics, TPH 2021 and the School for Young Scientists on Thermal Physics and Physical Hydrodynamics: Modern Challenges, TPHMC2021 - Sevastopol, Украина
Продолжительность: 22 авг. 202129 авг. 2021

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