Физика и астрономия
argon
100%
ion beams
67%
smoothing
47%
ions
44%
potassium phosphates
43%
single crystals
31%
roughness
28%
crystal surfaces
27%
surface treatment
27%
silicon dioxide
22%
gases
20%
size determination
19%
optical materials
17%
etching
17%
surface roughness
17%
atoms
16%
craters
15%
molecular beams
15%
bombardment
13%
ion irradiation
13%
energy
13%
sputtering
12%
contamination
11%
atomic force microscopy
11%
lithium
11%
cross sections
8%
profiles
7%
aluminum nitrides
7%
thin films
6%
interactions
5%
Технические дисциплины и материаловедение
Argon
72%
Ion beams
51%
Sputtering
49%
Ions
42%
Atoms
42%
Single crystal surfaces
25%
Size determination
20%
Surface morphology
19%
Aluminum nitride
18%
Fused silica
17%
Single crystals
17%
Potassium
15%
Phosphates
14%
Power spectral density
14%
Lithium
14%
Gases
14%
Silica
13%
Probability density function
12%
Thin films
12%
Surface roughness
10%
Kinetic energy
10%
Binding energy
10%
Molecular beams
7%
Molecules
7%
Optical materials
6%
Ion bombardment
6%
Химические соединения
Cluster Ion
31%
Sputtering
27%
Molecular Cluster
19%
Single Crystal Surface
16%
Silicon Dioxide
15%
Ion Beam
14%
Gas
9%
Binding Energy
7%
Ion Impact
7%
Energy
6%
Reaction Yield
5%
Hygroscopy
5%
