Transition from superhydrophilic to superhydrophobic of silicon wafer by a combination of laser treatment and fluoropolymer deposition

Sergey V. Starinskiy, Alexander V. Bulgakov, Elizaveta Ya Gatapova, Yuri G. Shukhov, Veronica S. Sulyaeva, Nikolay I. Timoshenko, Alexey I. Safonov

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

We propose a novel approach for synthesizing silicon surfaces ensuring arbitrary apparent contact angle within the range from 0° to 170° for water. Superhydrophilicity of silicon substrates is achieved by nanosecond laser treatment and subsequent change in the contact angle is obtained by deposition of fluoropolymer films with different thicknesses by a hot wire chemical vapor deposition (HWCVD) method. The deposited film thickness needed to obtain superhydrophobicity was determined. The wettability properties of the produced fluoropolymer-silicon system are analyzed using the Wenzel and Cassie theories.

Original languageEnglish
Article number255307
Number of pages7
JournalJournal Physics D: Applied Physics
Volume51
Issue number25
DOIs
Publication statusPublished - 27 Jun 2018

Keywords

  • fluoropolymer
  • HWCVD
  • laser treatment
  • superhydrophilic
  • superhydrophobic
  • DESIGN
  • WETTABILITY
  • BEHAVIOR
  • CONTACT ANGLES
  • SUBSTRATE
  • RESISTANCE
  • COATINGS
  • FABRICATION
  • EQUATION
  • SURFACES

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