Studying the microstructure of Pt layers prepared by chemical vapor deposition in the presence of hydrogen

S. I. Dorovskikh, D. D. Klyamer, T. P. Koretskaya, D. B. Kal′nyi, N. B. Morozova

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Platinum layers with developed surface areas are prepared for the first time on the contacts of diagnostic electrodes by chemical vapor deposition using the adduct between hexafluoroacetylacetonate-trimethylplatinum(IV) and pyridine used as the precursor in an atmosphere of hydrogen. The effect of the reagent gas concentration, deposition temperature, and gas phase activation temperature on the composition and microstructure of the films is studied by EDS, powder XRD, SEM, and Raman spectroscopy methods. The conditions of depositing films with minimal impurity contents are determined, the possibility of preparing layers with a fractal-like surface structure is demonstrated. The growth rate of the sample in the presence of hydrogen is shown to reach 3.2 nm/min. The regimes for the precipitation of functional layers on electrode contacts (capacitance values of 2.2-9.2 µF/cm2) and on Ti discs are determined.

Original languageEnglish
Pages (from-to)1211-1218
Number of pages8
JournalJournal of Structural Chemistry
Volume61
Issue number8
DOIs
Publication statusPublished - 1 Aug 2020

Keywords

  • chemical vapor deposition
  • electrochemically active surface area
  • film structure
  • platinum
  • SURFACE-AREA
  • STIMULATION/SENSING MATERIALS
  • PLATINUM
  • ELECTRODES
  • IR
  • NEURAL STIMULATION
  • ELECTROCHEMICAL-BEHAVIOR
  • PRECURSORS
  • IRIDIUM OXIDE

OECD FOS+WOS

  • 1.04 CHEMICAL SCIENCES

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