Smoothing of Polycrystalline AlN Thin Films with Argon Cluster Ions

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Abstract

Surface modification of polycrystalline thin films of aluminum nitride using bombardment with an cluster ion beam has been investigated. The treatment has been performed using high-energy (105 eV/atom) and low-energy (10 eV/atom) argon cluster ions. High-efficiency smoothing of the nanostructured surface in a wide range of spatial frequencies (v = 0.02–128 μm–1) at ultrasmall etching depth (<100 nm) is demonstrated by atomic force microscopy with the application of the power spectral density function of roughness.

Translated title of the contributionСглаживание тонких поликристаллических пленок AlN кластерными ионами аргона
Original languageEnglish
Article number12
Pages (from-to)301-304
Number of pages4
JournalTechnical Physics Letters
Volume47
Issue number4
DOIs
Publication statusPublished - Apr 2021

Keywords

  • aluminum nitride
  • cluster ion beam
  • surface smoothing
  • thin films

OECD FOS+WOS

  • 1.03 PHYSICAL SCIENCES AND ASTRONOMY

State classification of scientific and technological information

  • 29 PHYSICS

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