Reversible electrochemical modification of the surface of a semiconductor by an atomic-force microscope probe

A. S. Kozhukhov, D. V. Sheglov, A. V. Latyshev

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

A technique for reversible surface modification with an atomic-force-microscope (AFM) probe is suggested. In this method, no significant mechanical or topographic changes occur upon a local variation in the surface potential of a sample under the AFM probe. The method allows a controlled relative change in the ohmic resistance of a channel in a Hall bridge within the range 20–25%.

Original languageEnglish
Pages (from-to)420-422
Number of pages3
JournalSemiconductors
Volume51
Issue number4
DOIs
Publication statusPublished - 1 Apr 2017

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