Abstract
The relaxation of the electric current in a metal–nitride–oxide–semiconductor structure has been measured experimentally. The experiment has been compared with the calculation based on the two-band conduction model and the multiphonon mechanism of the ionization of traps. The upper estimate obtained for the recombination cross section from the comparison of the experiment with the calculation is found to be 5 × 10–13 cm2.
Original language | English |
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Pages (from-to) | 47-52 |
Number of pages | 6 |
Journal | Physics of the Solid State |
Volume | 59 |
Issue number | 1 |
DOIs | |
Publication status | Published - 1 Jan 2017 |
Keywords
- SILICON-NITRIDE FILMS
- MEMORY
- SEMICONDUCTOR
- IONIZATION
- TRANSPORT
- TRAP