Raman scattering study of nanoscale Mo/Si and Mo/Be periodic multilayer structures

Niranjan Kumar, Vladimir A. Volodin, Ruslan M. Smertin, Pavel A. Yunin, Vladimir N. Polkovnoikov, Kalpataru Panda, Andrey N. Nechay, Nikolay I. Chkhalo

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Investigation of the microstructure and phase analysis of the periodic Mo/Si and Mo/Be multilayers are essential for depositing high reflective multilayers that operate at soft x-ray to extreme ultraviolet radiations. Raman spectroscopy revealed the presence of an amorphous phase of silicon (Si) in the Mo/Si multilayers. Furthermore, the disorder of the amorphous Si phase was increased with decreasing the periodic thickness of the Si layers in the nanoscale Mo/Si multilayers. The polycrystalline Mo periodic layers coexisted with the amorphous silicon layers in the Mo/Si multilayers. In contrast, both the Mo and Be layers in the Mo/Be periodic multilayers were condensed into the polycrystalline phases. At higher annealing temperatures, the polycrystalline and amorphous phases in both the Mo/Si and Mo/Be multilayers were destroyed due to the extensive interdiffusion process. However, the amorphous Si phase was partially preserved due to the formation of crystalline intermetallic h-MoSi2 and t-MoSi2 phases, for critically thicker Si layers in periodic Mo/Si multilayers.

Original languageEnglish
Article number063408
Number of pages7
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume38
Issue number6
DOIs
Publication statusPublished - 1 Dec 2020

Keywords

  • SOFT-X-RAY
  • PHASE-FORMATION
  • A-SI
  • MIRRORS
  • BERYLLIUM
  • SPECTRA
  • REFLECTIVITY
  • BARRIER
  • MICROSTRUCTURE
  • LITHOGRAPHY

Fingerprint Dive into the research topics of 'Raman scattering study of nanoscale Mo/Si and Mo/Be periodic multilayer structures'. Together they form a unique fingerprint.

Cite this