Properties of ta-C coatings prepared by pulsed cathodic arc source at various distances

S. Chepkasov, A. Zolkin, D. Piliptsou, E. Gladkikh, K. Kravchuk

Research output: Contribution to journalConference articlepeer-review

Abstract

Tetrahedral amorphous carbon (ta-C) coatings have been prepared on silicon substrates by the pulsed cathodic arc source. For the limitation of the heat flux of the carbon plasma to the sample, the diaphragm of 27 mm diameter has been used. The deposition process has been carried out at three different distances between the arc source and the substrate: 150, 215 and 265 mm. The properties of ta-C coatings have been studied by Raman spectroscopy and dynamic nanoindentation techniques. The analysis of Raman spectra parameters has revealed that the concentration of ordered aromatic rings in Csp2 cluster decreases with distance between the arc source and the substrate while the concentration of chain groups increases. Nanoindentation has shown the decrease in nanohardness and Young's modulus with the distance. Nanohardness value falls from 21 GPa to 16 GPa and Young's modulus value goes down from 197 GPa to 177 GPa. So, it's possible to control the formation of ta-C coatings structure by changing distance between the pulsed cathodic arc source and the substrate.

Original languageEnglish
Article number032066
Number of pages6
JournalJournal of Physics: Conference Series
Volume1115
Issue number3
DOIs
Publication statusPublished - 27 Nov 2018
Event6th International Congress on Energy Fluxes and Radiation Effects 2018, EFRE 2018 - Tomsk, Russian Federation
Duration: 16 Sep 201822 Sep 2018

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