Potassium titanyl phosphate sputtering features by argon cluster ions

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Abstract

In this paper, we consider features of changes in surface morphology of potassium titanyl phosphate single crystal at the treatment of the argon cluster ion beam. It demonstrated that the sputtering process of the target surface at the small energy per atom in the cluster leads to a subnanometer level of the surface roughness. The sputtering yields and etching rates of potassium titanyl phosphate have been determined for small energy per atom in the argon cluster. We analyze the complex characteristic of surface quality is the power spectral density function of surface roughness for studying the surface smoothing effect of KTP single crystals by argon cluster ions.

Original languageEnglish
Title of host publicationProceedings - 2020 7th International Congress on Energy Fluxes and Radiation Effects, EFRE 2020
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages526-528
Number of pages3
ISBN (Electronic)9781728126869
DOIs
Publication statusPublished - 14 Sep 2020
Event7th International Congress on Energy Fluxes and Radiation Effects, EFRE 2020 - Virtual, Tomsk, Russian Federation
Duration: 14 Sep 202026 Sep 2020

Publication series

NameProceedings - 2020 7th International Congress on Energy Fluxes and Radiation Effects, EFRE 2020

Conference

Conference7th International Congress on Energy Fluxes and Radiation Effects, EFRE 2020
CountryRussian Federation
CityVirtual, Tomsk
Period14.09.202026.09.2020

Keywords

  • Atomic force microscopy (AFM)
  • Cluster ion beam
  • Potassium titanyl phosphate (KTP)
  • Power spectral density (PSD)
  • Smoothing
  • Sputtering
  • Subnanometer roughness

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