Optical Properties of the SiO x (x < 2) Thin Films Obtained by Hydrogen Plasma Processing of Thermal Silicon Dioxide

V. N. Kruchinin, T. V. Perevalov, V. Sh Aliev, R. M.Kh Iskhakzai, E. V. Spesivtsev, V. A. Gritsenko, V. A. Pustovarov

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