Influence of post-deposition annealing under magnetic field on the structure of phthalocyanine thin films

Tamara V. Basova, Irina V. Jushina, Asim K. Ray

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

A comparative analysis of the influence of post deposition annealing process without and under applied magnetic field of 1 T, on structure and morphology of VOPcF16 films, has been carried out. The phase transition of VOPcF16 film upon its annealing under applied magnetic film was studied by the methods of UV–Visible and Raman spectroscopies as well as atomic force microscopy. It was shown that the temperature of the phase transition of VOPcF16 decreases from 160 to 100 °C, when magnetic field is applied during post deposition annealing. The formation of VOPcF16 films with elongated crystallites oriented preferably in one direction was observed after their annealing in magnetic field. The current–voltage characteristic measurements demonstrated an increase in the lateral conductivity for the films annealed under applied magnetic field in comparison with the films annealed without magnetic field.

Original languageEnglish
Pages (from-to)4716-4721
Number of pages6
JournalJournal of Materials Science: Materials in Electronics
Volume26
Issue number7
DOIs
Publication statusPublished - 24 Jul 2015

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