Influence of magnetron sputtering modes of aluminum and aluminum nitride films on their surface, structure and composition

L. V. Baranova, V. I. Strunin, N. A. Chirikov

Research output: Contribution to journalConference articlepeer-review

Abstract

To ensure the optimal combination of the properties of the thin-film layers of piezoelectric structures and achieve the required characteristics of resonators and devices for selecting and generating of the signals based on them, the influence of technological modes of aluminum nitride films formation on the surface morphology, structure and elemental composition of films used in the construction of microelectronic bulk acoustic waves (BAW) resonator with Bragg reflector, the optimal modes are determined that satisfy the requirements for film layers for a piezoelectric transducer and Bragg reflector.

Original languageEnglish
Article number012023
JournalJournal of Physics: Conference Series
Volume1870
Issue number1
DOIs
Publication statusPublished - 19 Apr 2021
Event1st All-Russian Conference with International Participation on Gas Discharge Plasma and Synthesis of Nanostructures, GDP_NANO 2020 - Kazan, Russian Federation
Duration: 2 Dec 20205 Dec 2020

Keywords

  • elemental composition
  • film surface morphology
  • magnetron sputtering
  • scanning electron microscopy

OECD FOS+WOS

  • 1.03 PHYSICAL SCIENCES AND ASTRONOMY

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