Implementation of Terahertz High-Pass Filters Based on All-Metal Microstructures using Deep X-ray Lithography

A. N. Gentselev, S. A. Kuznetsov, F. N. Dultsev, B. G. Goldenberg, A. G. Zelinsky, V. I. Kondratyev, D. S. Tanygina

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

A method for fabricating high-pass terahertz quasi-optical filters in the form of thick (up to 1 mm in thickness) self-bearing copper microstructures of subwavelength topology is described. This method is based on forming a high-aspect-ratio mask of SU-8 resist on a silicon wafer via deep X-ray lithography through a tungsten X-ray mask followed by electroplating a copper layer through the resistive mask. An example of a 212-µm thick structure with a cutoff frequency of 0.42 THz having the geometry of hexagon-shaped through-holes arranged on a triangular lattice is considered. The results of broadband THz characterization and electromagnetic analysis of the structure fabricated are presented.

Original languageEnglish
Pages (from-to)115-125
Number of pages11
JournalOptoelectronics, Instrumentation and Data Processing
Volume55
Issue number2
DOIs
Publication statusPublished - 1 Mar 2019

Keywords

  • deep X-ray lithography
  • LIGA technology
  • microstructures
  • quasi-optical filters
  • terahertz range
  • SUBTERAHERTZ
  • TUNGSTEN

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