Formation of two-dimensional photonic crystals by electron-beam lithography

Dmitry E. Utkin, Dmitry A. Nasimov

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

2 Citations (Scopus)

Abstract

The approach to formation of two-dimensional photonic crystals with preset sizes of elements by the electron-beam lithography (EBL) is presented. The main problems appearing during formation of these structures are considered.

Original languageEnglish
Title of host publication12th International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2011 - Proceedings
Pages119-121
Number of pages3
DOIs
Publication statusPublished - 2011
Event12th International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2011 - Erlagol, Altai, Russian Federation
Duration: 30 Jun 20114 Jul 2011

Publication series

Name12th International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2011 - Proceedings

Conference

Conference12th International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, EDM'2011
CountryRussian Federation
CityErlagol, Altai
Period30.06.201104.07.2011

Keywords

  • lithography
  • Photonic crystal
  • Proximity effect

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