Formation of submicron- and micron-sized SiGe and Ge particles on Si substrates using dewetting

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Abstract

The arrays formation of submicron- and micron-sized SiGe and Ge dielectric particles on the Si and SiO2 surfaces, which occur due to solid-state dewetting, is investigated. The shape of the particles and their spatial distribution turned out to be strongly dependent on the crystallographic Si surface orientation, the amount of deposited Ge and the Ge deposition rate, as well as on the presence of a SiO2 film on the Si surface. Possible applications of various surface morphologies with metasurface properties are discussed.

Original languageEnglish
Article number012160
Number of pages3
JournalJournal of Physics: Conference Series
Volume1461
Issue number1
DOIs
Publication statusPublished - 23 Apr 2020
Event4th International Conference on Metamaterials and Nanophotonics, METANANO 2019 - St. Petersburg, Russian Federation
Duration: 15 Jul 201919 Jul 2019

Keywords

  • DEPOSITION

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