Formation of 2D-PhCs with missing holes based on Si-layers by EBL

D. E. Utkin, A. A. Shklyev, A. V. Tsarev, A. V. Latyshev

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The fabrication of the periodic structures, that is two-dimensional photonic crystals (2D PhCs) based on Si-materials by electron beam lithography (EBL) technique has been studied. We have investigated basic lithography processes such as designing, exposition, development, etching and others. The developed top-down approach allows close-packed arrays of elements and holes to be formed in nanometre range. This can be used to produce 2D PhCs with emitting micro-cavities (missing holes) with lateral size parameters with an accuracy of about 2% in the Si (100) substrate and in silicon-on-insulator structures. Such accuracy is expected to be sufficient for obtaining the cavities-coupling radiation interference from large areas of 2D PhCs.

Original languageEnglish
Article number062030
Number of pages3
JournalJournal of Physics: Conference Series
Issue number6
Publication statusPublished - 23 Nov 2017


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