Chemical vapour deposition of Ir-based coatings: Chemistry, processes and applications

V. Yu Vasilyev, N. B. Morozova, T. V. Basova, I. K. Igumenov, A. Hassan

Research output: Contribution to journalReview articlepeer-review

30 Citations (Scopus)

Abstract

Chemical and materials science aspects of iridium-containing thin film formation by Chemical Vapor Deposition (CVD) methods for modern high-precision technology applications are considered. Chemical approaches to the synthesis of the main precursors used in CVD techniques, thin film growth processes and mechanisms as well as the main structure, composition and properties of iridium-containing thin films are analyzed, and modern thin film application examples are outlined. Numerical characterization of iridium-based thin film growth in 3D objects is presented. This journal is

Original languageEnglish
Pages (from-to)32034-32063
Number of pages30
JournalRSC Advances
Volume5
Issue number41
DOIs
Publication statusPublished - 2015

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