Aluminium nitride thin films surface smoothing by argon cluster ions

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Abstract

In this paper, the opportunity of using an argon cluster ion beam for processing the surface of aluminium nitride polycrystalline thin films is studied. The treatment was carried out in two fundamentally different experimental modes, at high and low kinetic energy per atom in the cluster, 105 and 10 eV/atom, respectively. The possibility of highly effective smoothing of the surface of a nanostructured aluminium nitride thin film with a minimum depth of the removed (sputtered) material is demonstrated.

Original languageEnglish
Title of host publicationProceedings - 2020 7th International Congress on Energy Fluxes and Radiation Effects, EFRE 2020
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages722-725
Number of pages4
ISBN (Electronic)9781728126869
DOIs
Publication statusPublished - 14 Sep 2020
Event7th International Congress on Energy Fluxes and Radiation Effects, EFRE 2020 - Virtual, Tomsk, Russian Federation
Duration: 14 Sep 202026 Sep 2020

Publication series

NameProceedings - 2020 7th International Congress on Energy Fluxes and Radiation Effects, EFRE 2020

Conference

Conference7th International Congress on Energy Fluxes and Radiation Effects, EFRE 2020
CountryRussian Federation
CityVirtual, Tomsk
Period14.09.202026.09.2020

Keywords

  • Aluminium nitride thin films
  • Atomic force microscopy (AFM)
  • Gas cluster ion beam
  • Surface smoothing

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